... by experimental results. The pump is fabricated from silicon and glass substrates using standard MEMS fabrication techniques including deep reactive ion etching, trichlorosilane molecular vapor deposition, and metal-assisted chemical etching for porous silicon fabrication. Micromachined pressure sensors based...

...Masato Ikegawa; Yoshihumi Ogawa; Ryoji Fukuyama; Tatehito Usui; Jun’ichi Tanaka Gas flows in plasma etching reactors for semiconductor fabrication became a chief consideration in designing second-generation reactors with higher etching rates. An axisymmetrical model based on the direct simulation...