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Journal Articles

Direct Simulation Monte Carlo Analysis of Rarefied Gas Flow Structures and Ventilation of Etching Gas in Magneto-Microwave Plasma Etching Reactors

Masato Ikegawa, Yoshihumi Ogawa, Ryoji Fukuyama, Tatehito Usui, Jun’ichi Tanaka
Journal: Journal of Fluids Engineering
Publisher: ASME
Article Type: Additional Technical Papers
J. Fluids Eng. June 2002, 124(2): 476–482.
https://doi.org/10.1115/1.1459074
Published Online: May 28, 2002
... March 2001 27 November 2001 28 05 2002 semiconductor device manufacture etching plasma applications rarefied fluid dynamics Monte Carlo methods Highly-integrated semiconductor chips have advanced beyond the ULSI (Ultra Large Scale Integration) level that integrates more...
View Article titled, Direct Simulation Monte Carlo Analysis of Rarefied Gas Flow Structures and Ventilation of Etching Gas in Magneto-Microwave Plasma Etching Reactors
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Topics: Etching, Flow (Dynamics), Gas flow, Knudsen number, Plasma etching, Pressure, Ventilation, Plasmas (Ionized gases), Rarefied fluid dynamics, Simulation